Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications.

J.P. Kettle; J. Kettle; R.T. Hoyle; R.M. Perks; S. Dimov

doi:10.1116/1.2981081

Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications.

J.P. Kettle, J. Kettle, R.T. Hoyle, R.M. Perks, S. Dimov

Allbwn ymchwil: Cyfraniad at gyfnodolyn › Erthygl › adolygiad gan gymheiriaid

Iaith wreiddiol	Saesneg
Tudalennau (o-i)	1794-1799
Cyfnodolyn	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Cyfrol	26
Rhif cyhoeddi	5
Dynodwyr Gwrthrych Digidol (DOIs)	https://doi.org/10.1116/1.2981081
Statws	Cyhoeddwyd - 1 Medi 2008

Mynediad at Ddogfen

10.1116/1.2981081

Dyfynnu hyn

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title = "Overcoming material challenges for replication of {"}motheye lenses{"} using step and flash imprint lithography for optoelectronic applications.",

author = "J.P. Kettle and J. Kettle and R.T. Hoyle and R.M. Perks and S. Dimov",

year = "2008",

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doi = "10.1116/1.2981081",

language = "English",

volume = "26",

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journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

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Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications. / Kettle, J.P.; Kettle, J.; Hoyle, R.T. et al.
Yn: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Cyfrol 26, Rhif 5, 01.09.2008, t. 1794-1799.

Allbwn ymchwil: Cyfraniad at gyfnodolyn › Erthygl › adolygiad gan gymheiriaid

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T1 - Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications.

AU - Kettle, J.P.

AU - Kettle, J.

AU - Hoyle, R.T.

AU - Perks, R.M.

AU - Dimov, S.

PY - 2008/9/1

Y1 - 2008/9/1

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DO - 10.1116/1.2981081

M3 - Article

SN - 1071-1023

VL - 26

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EP - 1799

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

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