Third-order nonlinearity in silicon beyond 2350 nm

Faezeh Gholami; Sanja Zlatanovic; Aleksandar Simic; Lan Liu; David Borlaug; Nikola Alic; Maziar P. Nezhad; Yeshaiahu Fainman; Stojan Radic

doi:10.1063/1.3630130

Third-order nonlinearity in silicon beyond 2350 nm

Faezeh Gholami, Sanja Zlatanovic, Aleksandar Simic, Lan Liu, David Borlaug, Nikola Alic, Maziar P. Nezhad, Yeshaiahu Fainman, Stojan Radic

Ysgol Cyfrifiadureg a Pheirianneg

Allbwn ymchwil: Cyfraniad at gyfnodolyn › Erthygl › adolygiad gan gymheiriaid

Iaith wreiddiol	Saesneg
Cyfnodolyn	Applied Physics Letters
Cyfrol	99
Rhif cyhoeddi	8
Dynodwyr Gwrthrych Digidol (DOIs)	https://doi.org/10.1063/1.3630130
Statws	Cyhoeddwyd - 22 Awst 2011

Mynediad at Ddogfen

10.1063/1.3630130

Dyfynnu hyn

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title = "Third-order nonlinearity in silicon beyond 2350 nm",

author = "Faezeh Gholami and Sanja Zlatanovic and Aleksandar Simic and Lan Liu and David Borlaug and Nikola Alic and Nezhad, \{Maziar P.\} and Yeshaiahu Fainman and Stojan Radic",

year = "2011",

month = aug,

day = "22",

doi = "10.1063/1.3630130",

language = "English",

volume = "99",

journal = "Applied Physics Letters",

issn = "0003-6951",

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T1 - Third-order nonlinearity in silicon beyond 2350 nm

AU - Gholami, Faezeh

AU - Zlatanovic, Sanja

AU - Simic, Aleksandar

AU - Liu, Lan

AU - Borlaug, David

AU - Alic, Nikola

AU - Nezhad, Maziar P.

AU - Fainman, Yeshaiahu

AU - Radic, Stojan

PY - 2011/8/22

Y1 - 2011/8/22

U2 - 10.1063/1.3630130

DO - 10.1063/1.3630130

M3 - Article

SN - 0003-6951

VL - 99

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 8

ER -