Accommodation and Diffusion of Nd in Uranium Silicide - U3Si2
- Huan Liu
- , Luca Messina
- , Antoine Claisse
- , Simon Middleburgh
- , Thomas Schuler
- , Par Olsson
- KTH Royal Institute of Technology
- Westinghouse Electric Sweden AB
- CEA, DEs, IRESNE, DEC, Cadarache
- Université Paris-Saclay
Research output: Contribution to journal › Article › peer-review
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