Effect of generation and soft lithography on semiconducting dendrimer lasers.

J.R. Lawrence; E.B. Namdas; G.J. Richards; P.L. Burn; I.D. Samuel

doi:10.1002/adma.200602392

Effect of generation and soft lithography on semiconducting dendrimer lasers.

J.R. Lawrence
, E.B. Namdas
, G.J. Richards
, P.L. Burn
, I.D. Samuel

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	3000-3003
Journal	Advanced Materials
Volume	19
Issue number	19
DOIs	https://doi.org/10.1002/adma.200602392
Publication status	Published - 1 Oct 2007

Keywords

CHEMISTRY
MULTIDISCIPLINARY
PHYSICAL
MATERIALS SCIENCE

Access to Document

10.1002/adma.200602392

Cite this

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title = "Effect of generation and soft lithography on semiconducting dendrimer lasers.",

keywords = "CHEMISTRY, MULTIDISCIPLINARY, PHYSICAL, MATERIALS SCIENCE",

author = "J.R. Lawrence and E.B. Namdas and G.J. Richards and P.L. Burn and I.D. Samuel",

year = "2007",

month = oct,

day = "1",

doi = "10.1002/adma.200602392",

language = "English",

volume = "19",

pages = "3000--3003",

journal = "Advanced Materials",

issn = "0935-9648",

publisher = "Wiley-Blackwell",

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AU - Lawrence, J.R.

AU - Namdas, E.B.

AU - Richards, G.J.

AU - Burn, P.L.

AU - Samuel, I.D.

PY - 2007/10/1

Y1 - 2007/10/1

KW - CHEMISTRY

KW - MULTIDISCIPLINARY

KW - PHYSICAL

KW - MATERIALS SCIENCE

U2 - 10.1002/adma.200602392

DO - 10.1002/adma.200602392

M3 - Article

SN - 0935-9648

VL - 19

SP - 3000

EP - 3003

JO - Advanced Materials

JF - Advanced Materials

IS - 19

ER -