Fabrication of step-and-flash imprint lithography (S-FIL) templates using XeF2 enhanced focused ion-beam ething.

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	819-825
Journal	Applied Physics A: Materials Science and Processing
Volume	96
Issue number	4
DOIs	https://doi.org/10.1007/s00339-009-5319-7
Publication status	Published - 1 Sept 2009

Keywords

@article{a8b54740da124137b33b99a159a3c49d,

title = "Fabrication of step-and-flash imprint lithography (S-FIL) templates using XeF2 enhanced focused ion-beam ething.",

keywords = "MATERIALS SCIENCE, MULTIDISCIPLINARY, PHYSICS, APPLIED",

author = "J.P. Kettle and J. Kettle and R.T. Hoyle and S. Dimov",

year = "2009",

month = sep,

day = "1",

doi = "10.1007/s00339-009-5319-7",

language = "English",

volume = "96",

pages = "819--825",

journal = "Applied Physics A: Materials Science and Processing",

issn = "0947-8396",

publisher = "Springer Heidelberg",

number = "4",

}

TY - JOUR

T1 - Fabrication of step-and-flash imprint lithography (S-FIL) templates using XeF2 enhanced focused ion-beam ething.

AU - Kettle, J.P.

AU - Kettle, J.

AU - Hoyle, R.T.

AU - Dimov, S.

PY - 2009/9/1

Y1 - 2009/9/1

KW - MATERIALS SCIENCE

KW - MULTIDISCIPLINARY

KW - PHYSICS

KW - APPLIED

U2 - 10.1007/s00339-009-5319-7

DO - 10.1007/s00339-009-5319-7

M3 - Article

SN - 0947-8396

VL - 96

SP - 819

EP - 825

JO - Applied Physics A: Materials Science and Processing

JF - Applied Physics A: Materials Science and Processing

IS - 4

ER -