Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications.

J.P. Kettle; J. Kettle; R.T. Hoyle; R.M. Perks; S. Dimov

doi:10.1116/1.2981081

Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications.

J.P. Kettle, J. Kettle, R.T. Hoyle, R.M. Perks, S. Dimov

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	1794-1799
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	26
Issue number	5
DOIs	https://doi.org/10.1116/1.2981081
Publication status	Published - 1 Sept 2008

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10.1116/1.2981081

Cite this

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title = "Overcoming material challenges for replication of {"}motheye lenses{"} using step and flash imprint lithography for optoelectronic applications.",

author = "J.P. Kettle and J. Kettle and R.T. Hoyle and R.M. Perks and S. Dimov",

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language = "English",

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Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications. / Kettle, J.P.; Kettle, J.; Hoyle, R.T. et al.
In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 26, No. 5, 01.09.2008, p. 1794-1799.

Research output: Contribution to journal › Article › peer-review

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T1 - Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications.

AU - Kettle, J.P.

AU - Kettle, J.

AU - Hoyle, R.T.

AU - Perks, R.M.

AU - Dimov, S.

PY - 2008/9/1

Y1 - 2008/9/1

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SN - 1071-1023

VL - 26

SP - 1794

EP - 1799

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

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