Porth Ymchwil

Direct laser writing nanosized oligofluorene truxenes in UV-transparent photoresist microstructures.

Allbwn ymchwil: Cyfraniad at gyfnodolyn › Erthygl › adolygiad gan gymheiriaid

StandardStandard

Direct laser writing nanosized oligofluorene truxenes in UV-transparent photoresist microstructures. / Kuehne, A.J.; Elfstrom, D.; Mackintosh, A.R. et al.
Yn: Advanced Materials, Cyfrol 21, Rhif 7, 16.02.2009, t. 781-785.

Allbwn ymchwil: Cyfraniad at gyfnodolyn › Erthygl › adolygiad gan gymheiriaid

HarvardHarvard

Kuehne, AJ, Elfstrom, D, Mackintosh, AR, Kanibolotsky, AL, Guilhabert, B, Gu, E, Perepichka, IF, Skabara, PJ, Dawson, MD & Pethrick, RA 2009, 'Direct laser writing nanosized oligofluorene truxenes in UV-transparent photoresist microstructures.', Advanced Materials, cyfrol. 21, rhif 7, tt. 781-785. https://doi.org/10.1002/adma.200802656

APA

Kuehne, A. J., Elfstrom, D., Mackintosh, A. R., Kanibolotsky, A. L., Guilhabert, B., Gu, E., Perepichka, I. F., Skabara, P. J., Dawson, M. D., & Pethrick, R. A. (2009). Direct laser writing nanosized oligofluorene truxenes in UV-transparent photoresist microstructures. Advanced Materials, 21(7), 781-785. https://doi.org/10.1002/adma.200802656

CBE

Kuehne AJ, Elfstrom D, Mackintosh AR, Kanibolotsky AL, Guilhabert B, Gu E, Perepichka IF, Skabara PJ, Dawson MD, Pethrick RA. 2009. Direct laser writing nanosized oligofluorene truxenes in UV-transparent photoresist microstructures. Advanced Materials. 21(7):781-785. https://doi.org/10.1002/adma.200802656

MLA

Kuehne, A.J. et al. "Direct laser writing nanosized oligofluorene truxenes in UV-transparent photoresist microstructures.". Advanced Materials. 2009, 21(7). 781-785. https://doi.org/10.1002/adma.200802656

VancouverVancouver

Kuehne AJ, Elfstrom D, Mackintosh AR, Kanibolotsky AL, Guilhabert B, Gu E et al. Direct laser writing nanosized oligofluorene truxenes in UV-transparent photoresist microstructures. Advanced Materials. 2009 Chw 16;21(7):781-785. doi: 10.1002/adma.200802656

Author

Kuehne, A.J. ; Elfstrom, D. ; Mackintosh, A.R. et al. / Direct laser writing nanosized oligofluorene truxenes in UV-transparent photoresist microstructures. Yn: Advanced Materials. 2009 ; Cyfrol 21, Rhif 7. tt. 781-785.

RIS

TY - JOUR

T1 - Direct laser writing nanosized oligofluorene truxenes in UV-transparent photoresist microstructures.

AU - Kuehne, A.J.

AU - Elfstrom, D.

AU - Mackintosh, A.R.

AU - Kanibolotsky, A.L.

AU - Guilhabert, B.

AU - Gu, E.

AU - Perepichka, I.F.

AU - Skabara, P.J.

AU - Dawson, M.D.

AU - Pethrick, R.A.

PY - 2009/2/16

Y1 - 2009/2/16

KW - CHEMISTRY

KW - MULTIDISCIPLINARY

KW - PHYSICAL

KW - MATERIALS SCIENCE

KW - NANOSCIENCE & NANOTECHNOLOGY

KW - PHYSICS

KW - APPLIED

KW - CONDENSED MATTER

U2 - 10.1002/adma.200802656

DO - 10.1002/adma.200802656

M3 - Article

VL - 21

SP - 781

EP - 785

JO - Advanced Materials

JF - Advanced Materials

SN - 0935-9648

IS - 7

ER -