StandardStandard

Electric-field-induced band bending on GaN: in situ effects of electron beam irradiation on time-dependent cathodoluminescence. / Campo, E.; Campo, E.M.; Pophristic, M. et al.
Yn: Applied Optics, Cyfrol 54, Rhif 12, 20.04.2015, t. 3613-3623.

Allbwn ymchwil: Cyfraniad at gyfnodolynErthygladolygiad gan gymheiriaid

HarvardHarvard

Campo, E, Campo, EM, Pophristic, M, Hopkins, L & Ferguson, IT 2015, 'Electric-field-induced band bending on GaN: in situ effects of electron beam irradiation on time-dependent cathodoluminescence', Applied Optics, cyfrol. 54, rhif 12, tt. 3613-3623. https://doi.org/10.1364/AO.54.003613

APA

Campo, E., Campo, E. M., Pophristic, M., Hopkins, L., & Ferguson, I. T. (2015). Electric-field-induced band bending on GaN: in situ effects of electron beam irradiation on time-dependent cathodoluminescence. Applied Optics, 54(12), 3613-3623. https://doi.org/10.1364/AO.54.003613

CBE

MLA

VancouverVancouver

Campo E, Campo EM, Pophristic M, Hopkins L, Ferguson IT. Electric-field-induced band bending on GaN: in situ effects of electron beam irradiation on time-dependent cathodoluminescence. Applied Optics. 2015 Ebr 20;54(12):3613-3623. doi: 10.1364/AO.54.003613

Author

Campo, E. ; Campo, E.M. ; Pophristic, M. et al. / Electric-field-induced band bending on GaN: in situ effects of electron beam irradiation on time-dependent cathodoluminescence. Yn: Applied Optics. 2015 ; Cyfrol 54, Rhif 12. tt. 3613-3623.

RIS

TY - JOUR

T1 - Electric-field-induced band bending on GaN: in situ effects of electron beam irradiation on time-dependent cathodoluminescence

AU - Campo, E.

AU - Campo, E.M.

AU - Pophristic, M.

AU - Hopkins, L.

AU - Ferguson, I.T.

PY - 2015/4/20

Y1 - 2015/4/20

N2 - Electron beam bombardment of GaN has been monitored by secondary electron (SE), cathodoluminescence (CL) imaging, simultaneous in situ CL, and specimen current (SC) measurements. Under extreme irradiation conditions, system perturbations, as seen by SE and time-dependent CL, are attributed to internal charge dynamics extending beyond the scanned areas. Under moderate irradiation conditions, the size of affected regions correlates with nominal scanned regions. Time-dependent CL at the near band edge (NBE) revealed complex interplay with SC, which was modeled through band bending at the Au/GaN interface. The system has shown distinctive internal electric field dynamics upon sample handling, affecting both time-dependent CL spectra and SC as well as producing contrast reversal in SE imaging, to which humidity adsorption could be contributing. The band-bending model presented here can account for both moderate irradiation and humidity effects through variations of depletion widths and Schottky barrier heights. Our findings are consistent with current models where e-beam activated VGa promotes decreased NBE intensities and CN promotes DL emissions.

AB - Electron beam bombardment of GaN has been monitored by secondary electron (SE), cathodoluminescence (CL) imaging, simultaneous in situ CL, and specimen current (SC) measurements. Under extreme irradiation conditions, system perturbations, as seen by SE and time-dependent CL, are attributed to internal charge dynamics extending beyond the scanned areas. Under moderate irradiation conditions, the size of affected regions correlates with nominal scanned regions. Time-dependent CL at the near band edge (NBE) revealed complex interplay with SC, which was modeled through band bending at the Au/GaN interface. The system has shown distinctive internal electric field dynamics upon sample handling, affecting both time-dependent CL spectra and SC as well as producing contrast reversal in SE imaging, to which humidity adsorption could be contributing. The band-bending model presented here can account for both moderate irradiation and humidity effects through variations of depletion widths and Schottky barrier heights. Our findings are consistent with current models where e-beam activated VGa promotes decreased NBE intensities and CN promotes DL emissions.

U2 - 10.1364/AO.54.003613

DO - 10.1364/AO.54.003613

M3 - Article

VL - 54

SP - 3613

EP - 3623

JO - Applied Optics

JF - Applied Optics

SN - 1559-128X

IS - 12

ER -