Electron trapping and inversion layer formation in photoexcited metal-insulator-poly(3-hexylthiophene) capacitors

Allbwn ymchwil: Cyfraniad at gyfnodolynErthygladolygiad gan gymheiriaid

StandardStandard

Electron trapping and inversion layer formation in photoexcited metal-insulator-poly(3-hexylthiophene) capacitors. / Taylor, Martin; Drysdale, J.A.; Torres, I. et al.
Yn: Applied Physics Letters, Cyfrol 89, Rhif 18, 01.11.2006, t. 183512.

Allbwn ymchwil: Cyfraniad at gyfnodolynErthygladolygiad gan gymheiriaid

HarvardHarvard

Taylor, M, Drysdale, JA, Torres, I & Fernandez, O 2006, 'Electron trapping and inversion layer formation in photoexcited metal-insulator-poly(3-hexylthiophene) capacitors', Applied Physics Letters, cyfrol. 89, rhif 18, tt. 183512. https://doi.org/10.1063/1.2382727

APA

Taylor, M., Drysdale, J. A., Torres, I., & Fernandez, O. (2006). Electron trapping and inversion layer formation in photoexcited metal-insulator-poly(3-hexylthiophene) capacitors. Applied Physics Letters, 89(18), 183512. https://doi.org/10.1063/1.2382727

CBE

MLA

VancouverVancouver

Taylor M, Drysdale JA, Torres I, Fernandez O. Electron trapping and inversion layer formation in photoexcited metal-insulator-poly(3-hexylthiophene) capacitors. Applied Physics Letters. 2006 Tach 1;89(18):183512. Epub 2006 Tach 1. doi: 10.1063/1.2382727

Author

Taylor, Martin ; Drysdale, J.A. ; Torres, I. et al. / Electron trapping and inversion layer formation in photoexcited metal-insulator-poly(3-hexylthiophene) capacitors. Yn: Applied Physics Letters. 2006 ; Cyfrol 89, Rhif 18. tt. 183512.

RIS

TY - JOUR

T1 - Electron trapping and inversion layer formation in photoexcited metal-insulator-poly(3-hexylthiophene) capacitors

AU - Taylor, Martin

AU - Drysdale, J.A.

AU - Torres, I.

AU - Fernandez, O.

PY - 2006/11/1

Y1 - 2006/11/1

KW - PHYSICS

KW - APPLIED

U2 - 10.1063/1.2382727

DO - 10.1063/1.2382727

M3 - Article

VL - 89

SP - 183512

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 18

ER -