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Effect of generation and soft lithography on semiconducting dendrimer lasers.

Research output: Contribution to journal › Article › peer-review

Standard Standard

Effect of generation and soft lithography on semiconducting dendrimer lasers. / Lawrence, J.R.; Namdas, E.B.; Richards, G.J. et al.
In: Advanced Materials, Vol. 19, No. 19, 01.10.2007, p. 3000-3003.

Research output: Contribution to journal › Article › peer-review

HarvardHarvard

Lawrence, JR, Namdas, EB, Richards, GJ, Burn, PL & Samuel, ID 2007, 'Effect of generation and soft lithography on semiconducting dendrimer lasers.', Advanced Materials, vol. 19, no. 19, pp. 3000-3003. https://doi.org/10.1002/adma.200602392

APA

Lawrence, J. R., Namdas, E. B., Richards, G. J., Burn, P. L., & Samuel, I. D. (2007). Effect of generation and soft lithography on semiconducting dendrimer lasers. Advanced Materials, 19(19), 3000-3003. https://doi.org/10.1002/adma.200602392

CBE

Lawrence JR, Namdas EB, Richards GJ, Burn PL, Samuel ID. 2007. Effect of generation and soft lithography on semiconducting dendrimer lasers. Advanced Materials. 19(19):3000-3003. https://doi.org/10.1002/adma.200602392

MLA

Lawrence, J.R. et al. "Effect of generation and soft lithography on semiconducting dendrimer lasers.". Advanced Materials. 2007, 19(19). 3000-3003. https://doi.org/10.1002/adma.200602392

VancouverVancouver

Lawrence JR, Namdas EB, Richards GJ, Burn PL, Samuel ID. Effect of generation and soft lithography on semiconducting dendrimer lasers. Advanced Materials. 2007 Oct 1;19(19):3000-3003. doi: 10.1002/adma.200602392

Author

Lawrence, J.R. ; Namdas, E.B. ; Richards, G.J. et al. / Effect of generation and soft lithography on semiconducting dendrimer lasers. In: Advanced Materials. 2007 ; Vol. 19, No. 19. pp. 3000-3003.

RIS

TY - JOUR

T1 - Effect of generation and soft lithography on semiconducting dendrimer lasers.

AU - Lawrence, J.R.

AU - Namdas, E.B.

AU - Richards, G.J.

AU - Burn, P.L.

AU - Samuel, I.D.

PY - 2007/10/1

Y1 - 2007/10/1

KW - CHEMISTRY

KW - MULTIDISCIPLINARY

KW - PHYSICAL

KW - MATERIALS SCIENCE

U2 - 10.1002/adma.200602392

DO - 10.1002/adma.200602392

M3 - Article

VL - 19

SP - 3000

EP - 3003

JO - Advanced Materials

JF - Advanced Materials

SN - 0935-9648

IS - 19

ER -