Electrical response of highly ordered organic thin film metal-insulator-semiconductor devices.

Research output: Contribution to journalArticlepeer-review

Standard Standard

Electrical response of highly ordered organic thin film metal-insulator-semiconductor devices. / Ullah, M.; Taylor, D.M.; Schwödiauer, R. et al.
In: Journal of Applied Physics, Vol. 106, No. 11, 10.12.2009, p. 114505.

Research output: Contribution to journalArticlepeer-review

HarvardHarvard

Ullah, M, Taylor, DM, Schwödiauer, R, Sitter, H, Bauer, S, Sariciftci, NS & Singh, TB 2009, 'Electrical response of highly ordered organic thin film metal-insulator-semiconductor devices.', Journal of Applied Physics, vol. 106, no. 11, pp. 114505. https://doi.org/10.1063/1.3267045

APA

Ullah, M., Taylor, D. M., Schwödiauer, R., Sitter, H., Bauer, S., Sariciftci, N. S., & Singh, T. B. (2009). Electrical response of highly ordered organic thin film metal-insulator-semiconductor devices. Journal of Applied Physics, 106(11), 114505. https://doi.org/10.1063/1.3267045

CBE

Ullah M, Taylor DM, Schwödiauer R, Sitter H, Bauer S, Sariciftci NS, Singh TB. 2009. Electrical response of highly ordered organic thin film metal-insulator-semiconductor devices. Journal of Applied Physics. 106(11):114505. https://doi.org/10.1063/1.3267045

MLA

VancouverVancouver

Ullah M, Taylor DM, Schwödiauer R, Sitter H, Bauer S, Sariciftci NS et al. Electrical response of highly ordered organic thin film metal-insulator-semiconductor devices. Journal of Applied Physics. 2009 Dec 10;106(11):114505. doi: 10.1063/1.3267045

Author

Ullah, M. ; Taylor, D.M. ; Schwödiauer, R. et al. / Electrical response of highly ordered organic thin film metal-insulator-semiconductor devices. In: Journal of Applied Physics. 2009 ; Vol. 106, No. 11. pp. 114505.

RIS

TY - JOUR

T1 - Electrical response of highly ordered organic thin film metal-insulator-semiconductor devices.

AU - Ullah, M.

AU - Taylor, D.M.

AU - Schwödiauer, R.

AU - Sitter, H.

AU - Bauer, S.

AU - Sariciftci, N.S.

AU - Singh, T.B.

PY - 2009/12/10

Y1 - 2009/12/10

UR - http://link.aip.org/link/?JAP/106/114505

U2 - 10.1063/1.3267045

DO - 10.1063/1.3267045

M3 - Article

VL - 106

SP - 114505

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 11

ER -