Dielectrophoretic Particle Profiling System and Method. PCT/ WO 04/055505
Allbwn ymchwil: Patent
StandardStandard
Dielectrophoretic Particle Profiling System and Method. PCT/ WO 04/055505. / Lee, R.S. (Dyfeisiwr); Pethig, R. (Dyfeisiwr); Talary, M.S. (Dyfeisiwr).
Rhif y patent: US 7,063,777 B1. Ion 01, 2006.
Rhif y patent: US 7,063,777 B1. Ion 01, 2006.
Allbwn ymchwil: Patent
HarvardHarvard
Lee, RS, Pethig, R & Talary, MS Ion. 01 2006, Dielectrophoretic Particle Profiling System and Method. PCT/ WO 04/055505, Rhif y patent US 7,063,777 B1.
APA
Lee, R. S., Pethig, R., & Talary, M. S. (2006). Dielectrophoretic Particle Profiling System and Method. PCT/ WO 04/055505. (Rhif y patent US 7,063,777 B1).
CBE
Lee RS, Pethig R, Talary MS, dyfeiswyr. 2006 Ion 01. Dielectrophoretic Particle Profiling System and Method. PCT/ WO 04/055505. Rhif y patent US 7,063,777 B1.
MLA
Lee, R.S., R. Pethig a M.S. Talary, . 2006. Dielectrophoretic Particle Profiling System and Method. PCT/ WO 04/055505. Rhif y patent US 7,063,777 B1.
VancouverVancouver
Lee RS, Pethig R, Talary MS, dyfeiswyr. Dielectrophoretic Particle Profiling System and Method. PCT/ WO 04/055505. US 7,063,777 B1. 2006 Ion 1.
Author
RIS
TY - PAT
T1 - Dielectrophoretic Particle Profiling System and Method. PCT/ WO 04/055505
AU - Lee, R.S.
AU - Pethig, R.
AU - Talary, M.S.
PY - 2006/1/1
Y1 - 2006/1/1
UR - http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO1&Sect2=HITOFF&d=PALL&p=1&u=%2Fnetahtml%2FPTO%2Fsrchnum.htm&r=1&f=G&l=50&s1=7,063,777.PN.&OS=PN/7,063,777&RS=PN/7,063,777
M3 - Patent
M1 - US 7,063,777 B1
ER -