Etch-free low loss silicon waveguides using hydrogen silsesquioxane oxidation masks
Allbwn ymchwil: Cyfraniad at gyfnodolyn › Erthygl › adolygiad gan gymheiriaid
Fersiynau electronig
Dangosydd eitem ddigidol (DOI)
An etch-free fabrication technique for creating low loss silicon waveguides in the silicon-on-insulator material system is proposed and demonstrated. The approach consists of local oxidation of a silicon-on-insulator chip covered with a e-beam patterned hydrogen silsesquioxane mask. A single oxidation step converts hydrogen silsesquioxane to a glass-like compound and simultaneously defines the waveguides, bypassing the need for any wet or dry etching steps. The spectral response of ring resonators fabricated using this technique was used to characterize the waveguide losses. Intrinsic Q-factors as high as 1.57 × 106, corresponding to a waveguide loss of 0.35dB/cm, were measured.
| Iaith wreiddiol | Saesneg |
|---|---|
| Tudalennau (o-i) | 18827-18832 |
| Nifer y tudalennau | 6 |
| Cyfnodolyn | Optics Express |
| Cyfrol | 19 |
| Rhif y cyfnodolyn | 20 |
| Dyddiad ar-lein cynnar | 13 Medi 2011 |
| Dynodwyr Gwrthrych Digidol (DOIs) | |
| Statws | Cyhoeddwyd - 26 Medi 2011 |