Fabrication of step-and-flash imprint lithography (S-FIL) templates using XeF2 enhanced focused ion-beam ething.
Allbwn ymchwil: Cyfraniad at gyfnodolyn › Erthygl › adolygiad gan gymheiriaid
StandardStandard
Fabrication of step-and-flash imprint lithography (S-FIL) templates using XeF2 enhanced focused ion-beam ething. / Kettle, J.P.; Kettle, J.; Hoyle, R.T. et al.
Yn: Applied Physics A: Materials Science and Processing, Cyfrol 96, Rhif 4, 01.09.2009, t. 819-825.
Yn: Applied Physics A: Materials Science and Processing, Cyfrol 96, Rhif 4, 01.09.2009, t. 819-825.
Allbwn ymchwil: Cyfraniad at gyfnodolyn › Erthygl › adolygiad gan gymheiriaid
HarvardHarvard
Kettle, JP, Kettle, J, Hoyle, RT & Dimov, S 2009, 'Fabrication of step-and-flash imprint lithography (S-FIL) templates using XeF2 enhanced focused ion-beam ething.', Applied Physics A: Materials Science and Processing, cyfrol. 96, rhif 4, tt. 819-825. https://doi.org/10.1007/s00339-009-5319-7
APA
Kettle, J. P., Kettle, J., Hoyle, R. T., & Dimov, S. (2009). Fabrication of step-and-flash imprint lithography (S-FIL) templates using XeF2 enhanced focused ion-beam ething. Applied Physics A: Materials Science and Processing, 96(4), 819-825. https://doi.org/10.1007/s00339-009-5319-7
CBE
Kettle JP, Kettle J, Hoyle RT, Dimov S. 2009. Fabrication of step-and-flash imprint lithography (S-FIL) templates using XeF2 enhanced focused ion-beam ething. Applied Physics A: Materials Science and Processing. 96(4):819-825. https://doi.org/10.1007/s00339-009-5319-7
MLA
Kettle, J.P. et al. "Fabrication of step-and-flash imprint lithography (S-FIL) templates using XeF2 enhanced focused ion-beam ething.". Applied Physics A: Materials Science and Processing. 2009, 96(4). 819-825. https://doi.org/10.1007/s00339-009-5319-7
VancouverVancouver
Kettle JP, Kettle J, Hoyle RT, Dimov S. Fabrication of step-and-flash imprint lithography (S-FIL) templates using XeF2 enhanced focused ion-beam ething. Applied Physics A: Materials Science and Processing. 2009 Medi 1;96(4):819-825. doi: 10.1007/s00339-009-5319-7
Author
RIS
TY - JOUR
T1 - Fabrication of step-and-flash imprint lithography (S-FIL) templates using XeF2 enhanced focused ion-beam ething.
AU - Kettle, J.P.
AU - Kettle, J.
AU - Hoyle, R.T.
AU - Dimov, S.
PY - 2009/9/1
Y1 - 2009/9/1
KW - MATERIALS SCIENCE
KW - MULTIDISCIPLINARY
KW - PHYSICS
KW - APPLIED
U2 - 10.1007/s00339-009-5319-7
DO - 10.1007/s00339-009-5319-7
M3 - Article
VL - 96
SP - 819
EP - 825
JO - Applied Physics A: Materials Science and Processing
JF - Applied Physics A: Materials Science and Processing
SN - 0947-8396
IS - 4
ER -