Fabrication of step-and-flash imprint lithography (S-FIL) templates using XeF2 enhanced focused ion-beam ething.

Allbwn ymchwil: Cyfraniad at gyfnodolynErthygladolygiad gan gymheiriaid

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Fabrication of step-and-flash imprint lithography (S-FIL) templates using XeF2 enhanced focused ion-beam ething. / Kettle, J.P.; Kettle, J.; Hoyle, R.T. et al.
Yn: Applied Physics A: Materials Science and Processing, Cyfrol 96, Rhif 4, 01.09.2009, t. 819-825.

Allbwn ymchwil: Cyfraniad at gyfnodolynErthygladolygiad gan gymheiriaid

HarvardHarvard

Kettle, JP, Kettle, J, Hoyle, RT & Dimov, S 2009, 'Fabrication of step-and-flash imprint lithography (S-FIL) templates using XeF2 enhanced focused ion-beam ething.', Applied Physics A: Materials Science and Processing, cyfrol. 96, rhif 4, tt. 819-825. https://doi.org/10.1007/s00339-009-5319-7

APA

Kettle, J. P., Kettle, J., Hoyle, R. T., & Dimov, S. (2009). Fabrication of step-and-flash imprint lithography (S-FIL) templates using XeF2 enhanced focused ion-beam ething. Applied Physics A: Materials Science and Processing, 96(4), 819-825. https://doi.org/10.1007/s00339-009-5319-7

CBE

Kettle JP, Kettle J, Hoyle RT, Dimov S. 2009. Fabrication of step-and-flash imprint lithography (S-FIL) templates using XeF2 enhanced focused ion-beam ething. Applied Physics A: Materials Science and Processing. 96(4):819-825. https://doi.org/10.1007/s00339-009-5319-7

MLA

VancouverVancouver

Kettle JP, Kettle J, Hoyle RT, Dimov S. Fabrication of step-and-flash imprint lithography (S-FIL) templates using XeF2 enhanced focused ion-beam ething. Applied Physics A: Materials Science and Processing. 2009 Medi 1;96(4):819-825. doi: 10.1007/s00339-009-5319-7

Author

Kettle, J.P. ; Kettle, J. ; Hoyle, R.T. et al. / Fabrication of step-and-flash imprint lithography (S-FIL) templates using XeF2 enhanced focused ion-beam ething. Yn: Applied Physics A: Materials Science and Processing. 2009 ; Cyfrol 96, Rhif 4. tt. 819-825.

RIS

TY - JOUR

T1 - Fabrication of step-and-flash imprint lithography (S-FIL) templates using XeF2 enhanced focused ion-beam ething.

AU - Kettle, J.P.

AU - Kettle, J.

AU - Hoyle, R.T.

AU - Dimov, S.

PY - 2009/9/1

Y1 - 2009/9/1

KW - MATERIALS SCIENCE

KW - MULTIDISCIPLINARY

KW - PHYSICS

KW - APPLIED

U2 - 10.1007/s00339-009-5319-7

DO - 10.1007/s00339-009-5319-7

M3 - Article

VL - 96

SP - 819

EP - 825

JO - Applied Physics A: Materials Science and Processing

JF - Applied Physics A: Materials Science and Processing

SN - 0947-8396

IS - 4

ER -