Hybrid Diamond/Silicon Suspended Integrated Photonic Platform using SF6 Isotropic Etching
Allbwn ymchwil: Pennod mewn Llyfr/Adroddiad/Trafodion Cynhadledd › Cyfraniad i Gynhadledd › adolygiad gan gymheiriaid
A hybrid diamond/silicon air-clad ridge waveguide platform is demonstrated. The air-clad structure coupled with the wide transmission window of diamond can allow for the use of this architecture over a large wavelength range, especially for the longer infrared wavelengths. In order to provide vertical confinement, the silicon substrate was isotropically etched using S F6 plasma to create undercut diamond films. An in-depth analysis of the etch characteristics of this process was performed to highlight its potential to replace wet isotropic etching or XeF 2 isotropic vapour phase etching techniques. The performance of the waveguide at 1550 nm was measured, and yielded an average loss of 4.67 +/- 0.47 dB/mm.
| Iaith wreiddiol | Saesneg |
|---|---|
| Teitl | 2019 IEEE 2nd British and Irish Conference on Optics and Photonics (BICOP) |
| Man cyhoeddi | London |
| Cyhoeddwr | IEEE |
| Statws | Cyhoeddwyd - 9 Ebr 2020 |