Hybrid Diamond/Silicon Suspended Integrated Photonic Platform using SF6 Isotropic Etching
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review
A hybrid diamond/silicon air-clad ridge waveguide platform is demonstrated. The air-clad structure coupled with the wide transmission window of diamond can allow for the use of this architecture over a large wavelength range, especially for the longer infrared wavelengths. In order to provide vertical confinement, the silicon substrate was isotropically etched using S F6 plasma to create undercut diamond films. An in-depth analysis of the etch characteristics of this process was performed to highlight its potential to replace wet isotropic etching or XeF 2 isotropic vapour phase etching techniques. The performance of the waveguide at 1550 nm was measured, and yielded an average loss of 4.67 +/- 0.47 dB/mm.
| Original language | English |
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| Title of host publication | 2019 IEEE 2nd British and Irish Conference on Optics and Photonics (BICOP) |
| Place of Publication | London |
| Publisher | IEEE |
| Publication status | Published - 9 Apr 2020 |