Quantum-interferometric optical lithography: Towards arbitrary two-dimensional patterns.
Allbwn ymchwil: Cyfraniad at gyfnodolyn › Erthygl › adolygiad gan gymheiriaid
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Quantum-interferometric optical lithography: Towards arbitrary two-dimensional patterns. / Kok, P.; Boto, A.N.; Abrams, D.S. et al.
Yn: Physical Review A, Cyfrol 63, Rhif 6, 01.06.2001, t. 063407.
Yn: Physical Review A, Cyfrol 63, Rhif 6, 01.06.2001, t. 063407.
Allbwn ymchwil: Cyfraniad at gyfnodolyn › Erthygl › adolygiad gan gymheiriaid
HarvardHarvard
Kok, P, Boto, AN, Abrams, DS, Williams, CP, Braunstein, SL & Dowling, JP 2001, 'Quantum-interferometric optical lithography: Towards arbitrary two-dimensional patterns.', Physical Review A, cyfrol. 63, rhif 6, tt. 063407. https://doi.org/10.1103/PhysRevA.63.063407
APA
Kok, P., Boto, A. N., Abrams, D. S., Williams, C. P., Braunstein, S. L., & Dowling, J. P. (2001). Quantum-interferometric optical lithography: Towards arbitrary two-dimensional patterns. Physical Review A, 63(6), 063407. https://doi.org/10.1103/PhysRevA.63.063407
CBE
Kok P, Boto AN, Abrams DS, Williams CP, Braunstein SL, Dowling JP. 2001. Quantum-interferometric optical lithography: Towards arbitrary two-dimensional patterns. Physical Review A. 63(6):063407. https://doi.org/10.1103/PhysRevA.63.063407
MLA
Kok, P. et al. "Quantum-interferometric optical lithography: Towards arbitrary two-dimensional patterns.". Physical Review A. 2001, 63(6). 063407. https://doi.org/10.1103/PhysRevA.63.063407
VancouverVancouver
Kok P, Boto AN, Abrams DS, Williams CP, Braunstein SL, Dowling JP. Quantum-interferometric optical lithography: Towards arbitrary two-dimensional patterns. Physical Review A. 2001 Meh 1;63(6):063407. doi: 10.1103/PhysRevA.63.063407
Author
RIS
TY - JOUR
T1 - Quantum-interferometric optical lithography: Towards arbitrary two-dimensional patterns.
AU - Kok, P.
AU - Boto, A.N.
AU - Abrams, D.S.
AU - Williams, C.P.
AU - Braunstein, S.L.
AU - Dowling, J.P.
PY - 2001/6/1
Y1 - 2001/6/1
KW - OPTICS
KW - PHYSICS
KW - ATOMIC
KW - MOLECULAR & CHEMICAL
U2 - 10.1103/PhysRevA.63.063407
DO - 10.1103/PhysRevA.63.063407
M3 - Article
VL - 63
SP - 063407
JO - Physical Review A
JF - Physical Review A
SN - 1050-2947
IS - 6
ER -