Quantum-interferometric optical lithography: Towards arbitrary two-dimensional patterns.

Research output: Contribution to journalArticlepeer-review

Standard Standard

Quantum-interferometric optical lithography: Towards arbitrary two-dimensional patterns. / Kok, P.; Boto, A.N.; Abrams, D.S. et al.
In: Physical Review A, Vol. 63, No. 6, 01.06.2001, p. 063407.

Research output: Contribution to journalArticlepeer-review

HarvardHarvard

Kok, P, Boto, AN, Abrams, DS, Williams, CP, Braunstein, SL & Dowling, JP 2001, 'Quantum-interferometric optical lithography: Towards arbitrary two-dimensional patterns.', Physical Review A, vol. 63, no. 6, pp. 063407. https://doi.org/10.1103/PhysRevA.63.063407

APA

Kok, P., Boto, A. N., Abrams, D. S., Williams, C. P., Braunstein, S. L., & Dowling, J. P. (2001). Quantum-interferometric optical lithography: Towards arbitrary two-dimensional patterns. Physical Review A, 63(6), 063407. https://doi.org/10.1103/PhysRevA.63.063407

CBE

Kok P, Boto AN, Abrams DS, Williams CP, Braunstein SL, Dowling JP. 2001. Quantum-interferometric optical lithography: Towards arbitrary two-dimensional patterns. Physical Review A. 63(6):063407. https://doi.org/10.1103/PhysRevA.63.063407

MLA

VancouverVancouver

Kok P, Boto AN, Abrams DS, Williams CP, Braunstein SL, Dowling JP. Quantum-interferometric optical lithography: Towards arbitrary two-dimensional patterns. Physical Review A. 2001 Jun 1;63(6):063407. doi: 10.1103/PhysRevA.63.063407

Author

Kok, P. ; Boto, A.N. ; Abrams, D.S. et al. / Quantum-interferometric optical lithography: Towards arbitrary two-dimensional patterns. In: Physical Review A. 2001 ; Vol. 63, No. 6. pp. 063407.

RIS

TY - JOUR

T1 - Quantum-interferometric optical lithography: Towards arbitrary two-dimensional patterns.

AU - Kok, P.

AU - Boto, A.N.

AU - Abrams, D.S.

AU - Williams, C.P.

AU - Braunstein, S.L.

AU - Dowling, J.P.

PY - 2001/6/1

Y1 - 2001/6/1

KW - OPTICS

KW - PHYSICS

KW - ATOMIC

KW - MOLECULAR & CHEMICAL

U2 - 10.1103/PhysRevA.63.063407

DO - 10.1103/PhysRevA.63.063407

M3 - Article

VL - 63

SP - 063407

JO - Physical Review A

JF - Physical Review A

SN - 1050-2947

IS - 6

ER -