TY - GEN

T1 - Hybrid Diamond/Silicon Suspended Integrated Photonic Platform using SF6 Isotropic Etching

AU - Abdou, Aly

AU - Richter, Jens

AU - Thomas, Evan L. H.

AU - Mandal, Soumen

AU - Ren, Zhong

AU - Pedersen, Rasmus H.

AU - Williams, Oliver A.

AU - Witzens, Jeremy

AU - Nezhad, M.P.

AU - Panduranga, Parashara

PY - 2020/4/9

Y1 - 2020/4/9

N2 - A hybrid diamond/silicon air-clad ridge waveguide platform is demonstrated. The air-clad structure coupled with the wide transmission window of diamond can allow for the use of this architecture over a large wavelength range, especially for the longer infrared wavelengths. In order to provide vertical confinement, the silicon substrate was isotropically etched using S F6 plasma to create undercut diamond films. An in-depth analysis of the etch characteristics of this process was performed to highlight its potential to replace wet isotropic etching or XeF 2 isotropic vapour phase etching techniques. The performance of the waveguide at 1550 nm was measured, and yielded an average loss of 4.67 +/- 0.47 dB/mm.

AB - A hybrid diamond/silicon air-clad ridge waveguide platform is demonstrated. The air-clad structure coupled with the wide transmission window of diamond can allow for the use of this architecture over a large wavelength range, especially for the longer infrared wavelengths. In order to provide vertical confinement, the silicon substrate was isotropically etched using S F6 plasma to create undercut diamond films. An in-depth analysis of the etch characteristics of this process was performed to highlight its potential to replace wet isotropic etching or XeF 2 isotropic vapour phase etching techniques. The performance of the waveguide at 1550 nm was measured, and yielded an average loss of 4.67 +/- 0.47 dB/mm.

M3 - Conference contribution

BT - 2019 IEEE 2nd British and Irish Conference on Optics and Photonics (BICOP)

PB - IEEE

CY - London

ER -