Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications.
Allbwn ymchwil: Cyfraniad at gyfnodolyn › Erthygl › adolygiad gan gymheiriaid
StandardStandard
Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications. / Kettle, J.P.; Kettle, J.; Hoyle, R.T. et al.
Yn: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Cyfrol 26, Rhif 5, 01.09.2008, t. 1794-1799.
Yn: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Cyfrol 26, Rhif 5, 01.09.2008, t. 1794-1799.
Allbwn ymchwil: Cyfraniad at gyfnodolyn › Erthygl › adolygiad gan gymheiriaid
HarvardHarvard
Kettle, JP, Kettle, J, Hoyle, RT, Perks, RM & Dimov, S 2008, 'Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications.', Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, cyfrol. 26, rhif 5, tt. 1794-1799. https://doi.org/10.1116/1.2981081
APA
Kettle, J. P., Kettle, J., Hoyle, R. T., Perks, R. M., & Dimov, S. (2008). Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 26(5), 1794-1799. https://doi.org/10.1116/1.2981081
CBE
Kettle JP, Kettle J, Hoyle RT, Perks RM, Dimov S. 2008. Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 26(5):1794-1799. https://doi.org/10.1116/1.2981081
MLA
Kettle, J.P. et al. "Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications.". Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2008, 26(5). 1794-1799. https://doi.org/10.1116/1.2981081
VancouverVancouver
Kettle JP, Kettle J, Hoyle RT, Perks RM, Dimov S. Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2008 Medi 1;26(5):1794-1799. doi: 10.1116/1.2981081
Author
RIS
TY - JOUR
T1 - Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications.
AU - Kettle, J.P.
AU - Kettle, J.
AU - Hoyle, R.T.
AU - Perks, R.M.
AU - Dimov, S.
PY - 2008/9/1
Y1 - 2008/9/1
U2 - 10.1116/1.2981081
DO - 10.1116/1.2981081
M3 - Article
VL - 26
SP - 1794
EP - 1799
JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
SN - 1071-1023
IS - 5
ER -