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Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications.

Research output: Contribution to journal › Article › peer-review

Standard Standard

Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications. / Kettle, J.P.; Kettle, J.; Hoyle, R.T. et al.
In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 26, No. 5, 01.09.2008, p. 1794-1799.

Research output: Contribution to journal › Article › peer-review

HarvardHarvard

Kettle, JP, Kettle, J, Hoyle, RT, Perks, RM & Dimov, S 2008, 'Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications.', Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 26, no. 5, pp. 1794-1799. https://doi.org/10.1116/1.2981081

APA

Kettle, J. P., Kettle, J., Hoyle, R. T., Perks, R. M., & Dimov, S. (2008). Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 26(5), 1794-1799. https://doi.org/10.1116/1.2981081

CBE

Kettle JP, Kettle J, Hoyle RT, Perks RM, Dimov S. 2008. Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 26(5):1794-1799. https://doi.org/10.1116/1.2981081

MLA

Kettle, J.P. et al. "Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications.". Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2008, 26(5). 1794-1799. https://doi.org/10.1116/1.2981081

VancouverVancouver

Kettle JP, Kettle J, Hoyle RT, Perks RM, Dimov S. Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2008 Sept 1;26(5):1794-1799. doi: 10.1116/1.2981081

Author

Kettle, J.P. ; Kettle, J. ; Hoyle, R.T. et al. / Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications. In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2008 ; Vol. 26, No. 5. pp. 1794-1799.

RIS

TY - JOUR

T1 - Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications.

AU - Kettle, J.P.

AU - Kettle, J.

AU - Hoyle, R.T.

AU - Perks, R.M.

AU - Dimov, S.

PY - 2008/9/1

Y1 - 2008/9/1

U2 - 10.1116/1.2981081

DO - 10.1116/1.2981081

M3 - Article

VL - 26

SP - 1794

EP - 1799

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

SN - 1071-1023

IS - 5

ER -