Standard Standard

Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications. / Kettle, J.P.; Kettle, J.; Hoyle, R.T.; Perks, R.M.; Dimov, S.

In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 26, No. 5, 01.09.2008, p. 1794-1799.

Research output: Contribution to journalArticle

HarvardHarvard

Kettle, JP, Kettle, J, Hoyle, RT, Perks, RM & Dimov, S 2008, 'Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications.', Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 26, no. 5, pp. 1794-1799. https://doi.org/10.1116/1.2981081

APA

Kettle, J. P., Kettle, J., Hoyle, R. T., Perks, R. M., & Dimov, S. (2008). Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 26(5), 1794-1799. https://doi.org/10.1116/1.2981081

CBE

Kettle JP, Kettle J, Hoyle RT, Perks RM, Dimov S. 2008. Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 26(5):1794-1799. https://doi.org/10.1116/1.2981081

MLA

VancouverVancouver

Kettle JP, Kettle J, Hoyle RT, Perks RM, Dimov S. Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2008 Sep 1;26(5):1794-1799. https://doi.org/10.1116/1.2981081

Author

Kettle, J.P. ; Kettle, J. ; Hoyle, R.T. ; Perks, R.M. ; Dimov, S. / Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications. In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2008 ; Vol. 26, No. 5. pp. 1794-1799.

RIS

TY - JOUR

T1 - Overcoming material challenges for replication of "motheye lenses" using step and flash imprint lithography for optoelectronic applications.

AU - Kettle, J.P.

AU - Kettle, J.

AU - Hoyle, R.T.

AU - Perks, R.M.

AU - Dimov, S.

PY - 2008/9/1

Y1 - 2008/9/1

U2 - 10.1116/1.2981081

DO - 10.1116/1.2981081

M3 - Article

VL - 26

SP - 1794

EP - 1799

JO - Journal of Vacuum Science and Technology B

JF - Journal of Vacuum Science and Technology B

SN - 1071-1023

IS - 5

ER -